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Product innovation at the forefront of thin film materials

R & D
Heraeus runs two fully equipped Research & Development laboratories for Sputtering Targets: at its Hanau (Germany) and Chandler, Arizona (USA) sites. In addition to these, dedicated product development teams support our various production facilities around the globe.
Short time to market and a close cooperation with our customers is the primary goal of our R&D teams. With a clear focus on the local products, our development activities comprise the following technologies for round, planar and tubular targets.
 
By combining R & D equipment and production tools, our teams are able to run feasibility tests quickly, while the major development work is usually done full scale to avoid difficulties during up-scaling. While most of the projects utilize in-house tools, we leverage the materials and manufacturing expertise in new areas by closely co-operating with partners and universities in selected technologies.

Technologies

Melting and casting
Thermomechanical treatment
Advanced powder metallurgy (CIP, HIP, HP, sintering)
Thermal spraying
Bonding
Thin films

Sputter Application Lab

Our fully equipped multiple-cathode sputter application lab in Hanau enables planar and rotatable cathode tests for immediate feedback on new materials and film properties. In addition, co-development activities with our customers can be supported up to a substrate size of 400x600mm. Call us for detail.
 
On-site analytical capabilities are key for fast and full characterization of our materials. Here, the Thin Film Materials Division benefits from the broad materials background at Heraeus. Our on-site laboratories cover:

Laboratories

Metallography
Physical characterization Density / Hardness / Bending strength / Thermal conductivity / Dilatometer / TGA / DSC / DTA / XRD / EPMA / EBSD / WDX / SEM / EDX / Sputter-Auger
Chemical characterization GDMS / LECO / GDL / ICP / RFA